SAN FRANCISCO—Metrology tool vendor Nanometrics Inc. Wednesday (Aug. 3) filed a patent infringement lawsuit against rival KLA-Tencor Corp. in U.S. federal court.
The lawsuit, filed in U.S. District Court in Delaware, accuses KLA-Tencor (Milpitas, Calif.) of violated two Nanometrics patents related to metrology. The suit seeks a court-ordered enjoinment on allegedly infringing KLA-Tencor products and unspecified damages.
The Nanometrics patents at issue in the case are U.S. patent No. 6,982,793 B1, "Method and Apparatus for Using and Alignment Target with Designed In Offset," and U.S. patent No. 7,230,705 B1, "Alignment Target with Designed Offset."
A spokesperson for Nanometrics (Milpitas) did not immediately respond to a request for comment on the case.
KLA-Tencor, Nanometrics, Metrology, Patents, Suit Nanometrics files patent suit against KLA
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